Phildal Holding Co.,Ltd-Sputtering Targets Manufacturer-China - Cr Target,Al Target,Ni Target,WC Target,B4C Target,TiB2 Target,Al-Cr Target,Al-Ti Target,Al-Si Target,Cu-Ni Target,Ni-Cr Target,W-Ti Target

Phildal Holding Co., Ltd.

PHILDAL HOLDING CO., LIMITED is a professional provider located in Shanghai supplying high performance thin film materials.

We manufacture a wide range of sputtering targets to vacuum coating industry, and also provide evaporation materials according to customer requirements.

Due to our advanced production technology and strict testing system, we produce qualified sputtering targets and keep the quality consistency well. Besides, we have a variety of raw materials consistently in stock to help to achieve fast delivery.

And furthermore, we will never stop our steps on R&D. We have good experience of developing new sputtering targets for our clients and get good feedback. We are glad to do our best to create helpful products.

If you have any opinion or request, please don't hestate to contact us to discuss.

The materials of our sputtering targets including but not limited to following:

Pure metal sputtering targets

Al: Aluminium Target	Mo: Molybdenum Target
B: Boron Target	Nb: Niobium Target
Bi: Bismuth Target	Ni: Nickel Target
Co: Cobalt Target	Sb: Antimony Target
Cr: Chromium Target	Sn: Tin Target
Cu: Copper Target	Sr: Strontium Target
Er: Erbium Target	Ta: Tantalum Target
Fe: Iron Target	Ti: Titanium Target
Gd: Gadolinium Target	V: Vanadium Target
Hf: Hafnium Target	W: Tungsten Target
In: Indium Target	Y: Yttrium Target
Mg: Magnesium Target	Zr: Zirconium Target
Mn: Manganese Target

Alloy sputtering targets

Aluminium-Titanium Target: Al(60)Ti(40)at%

Aluminium-Titanium Target: Al(67)Ti(33)at%

Aluminium-Silicon Target: Al(99)Si(1)wt%

Aluminium-Chromium Target: Al(50)Cr(50)at%

Aluminium-Chromium Target: Al(60)Cr(40)at%

Aluminium-Copper Target: Al(99.5)Cu(0.5)wt%

Aluminium-Neodymium Target: Al(99)Nd(1)wt%

Chromium-Aluminium Target: Cr(60)Al(40)at%

Cobalt-Iron Target: Co(50)Fe(50)wt%

Cobalt-Iron-Boron Target: Co(60)Fe(20)B(20)at%

Copper-Nickel Target: Cu(55)Ni(45)wt%

Copper-Nickel Target: Cu(90)Ni(10)wt%

Copper-Zirconium Target: Cu(50)Zr(50)at%

Copper-Nickel-Manganese Target: Cu(54)Ni(45)Mn(1)wt%

Iron-Manganese Target: Fe(50)Mn(50)wt%

Iron-Tin Target: Fe(50)Sn(50)at%

Iron-Boron-Cobalt Target: Fe(70)B(20)Co(10)at%

Magnesium-Yttrium Target: Mg(95)Y(5)wt%

Magnesium-Zinc-Calcium Target: Mg(96.5)Zn(3)Ca(0.5)wt%

Manganese-Aluminium Target: Mn(60)Al(40)at%

Molybdenum-Niobium Target: Mo(90)Nb(10)wt%

Nickel-Indium Target: Ni(50)In(50)at%

Nickel-Chromium Target: Ni(80)Cr(20)wt%

Nickel-Chromium Target: Ni(90)Cr(10)wt%

Nickel-Iron Target: Ni(82)Fe(18)wt%

Nickel-Vanadium Target: Ni(93)V(7)wt%

Titanium-Niobium Target: Ti(52)Nb(48)wt%

Titanium-Aluminium-Vanadium Target: Ti(90)Al(6)V(4)wt%

Titanium-Silicon Target: Ti(85)Si(15)at%

Titanium-Silver Target: Ti(95)Ag(5)wt%

Tungsten-Copper Target: W(65)Cu(35)wt%

Tungsten-Titanium Target: W(70)Ti(30)at%

Tungsten-Titanium Target: W(90)Ti(10)wt%

Zirconium-Aluminium Target: Zr(70)Al(30)at%

Other compound sputtering targets

Al2O3: Aluminium oxide Target	SiC: Silicon carbide Target
AlN: Aluminium nitride Target	TiB2: Titanium diboride Target
B4C: Boron carbide Target	TiN: Titanium nitride Target
Bi2FeCrO6 Target	WC: Tungsten carbide Target
BiFeO3 Target	WC-12Co Target
BiMnO3 Target	YMnO3 Target
In2O3: Indium oxide Target	ZnO(95)Al2O3(5)wt%
ITO Target: In2O3(90)SnO2(10)wt%	ZnO(99.5)Al2O3(0.5)wt%
MoS2: Molybdenum disulfide Target	ZnO: Zinc oxide Target

For other materials or customizing specifications, please feel free to contact us via sales@phildal-targets.com